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| Atomic Absorption Spectrophotometer ( PinAAcle™ 900 series ) |
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| For laboratories needing a high-performance flame atomic absorption (AA) spectrometer, the PinAAcle™ 900 series is a right choice… |
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Flame only, furnace only, or space-saving stacked designs featuring both. |
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Flame, furnace, flow injection, FIAS-furnace and mercury/hydride |
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capabilities on a single instrument. |
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Choice of Deuterium or longitudinal Zeeman background correction. |
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TubeView™ color furnace camera simplifies autosampler tip alignment |
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and sample dispensing. | | |
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| ICP-OES (Avio 500) |
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| PerkinElmer’s new Avio® 500 is a truly simultaneous, dual view, and compact ICP-OES. It utilizes a vertical plasma and is engineered to handle even the most difficult, high-matrix samples without dilution, delivering productivity, performance, and faster return on investment. |
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Vertical Plasma Torch Design: provides 100% matrix tolerance, minimizing |
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sample preparation time.. |
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Flat Plate™ Plasma Technology: delivers a more robust, stable plasma |
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and the lowest argon consumption of any ICP (50% less than other systems). |
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Dual View: optimizes axial and radial plasma viewing to the extended |
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linear dynamic range, measuring high and low concentrations in the same run, regardless of wavelength. |
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PlasmaShear™ System: offers maintenance-free, argon-free interference |
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removal. |
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Universal Data Acquisition: enables simultaneous acquisition of all |
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available wavelengths, with virtually no time or storage penalty. |
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Color PlasmaCam™: for real-time viewing status evaluation of plasma, |
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injector, and torch during analysis. | | |
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| ICP-MS (NexION 5000) |
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| The NexION® 5000 multi-quadrupole ICP-MS system is the first in its category to boast four quads – is innovatively designed to meet and exceed the demanding trace-elemental testing requirements of semiconductor, biomonitoring and other applications. It takes ICP-MS performance beyond high-resolution ICP-MS and traditional triple-quad technology to deliver exceptionally low background equivalent concentrations (<1 ppt, even in hot plasma) |
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Extended Dynamic Range (EDR) increases linear dynamic range to 1012, |
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allowing to run both high and low concentration analytes in a single analytical run, resulting in fewer re-runs |
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Low maintenance for greater uptime |
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Triple Cone Interface with patent-pending OmniRing™ combined with |
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Quadrupole Ion Deflector deliver no maintenance beyond cones, for continual operation and improved stability |
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34 MHz free-running RF generator offers trouble-free user |
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experience – the plasma is generated by the unique LumiCoil™ RF load coil, which is air cooled (does not require water or gas cooling), so maintenance-free, eliminating need to replace plasma load coils | |
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